Juraj Nevrela, Anton Kuzma


The contribution deals with creating structure, which have unique properties for influencing the spectrum of light. Since these structures exhibit the period under the diffraction limit of visible light or UV radiation, they can’t be fabricated by standard photolithography. As a result, this nanoscale structure must be prepared with progressive nanostructure patterning technology known as nanoimprint lithography (NIL). Especially, in our work UV-nanoimprint lithography was used. Considering preservation of low production costs, which plays a crucial role in the industry, the UV-nanoimprint lithography will be best suit for this purpose. Using this technology result with respect to reproducibility and uniformity of created nanostructure has been achieved. Ability of influencing light spectrum for nanostructures with the period of 800 nm and 600 nm with various feature size were presented with observation and simulation also.


PhC; nanostructure; NIL; hard stamp; UV-exposure; next generation of nanoscale lithography; RCWA; LED; RIE; AFM

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DOI: http://dx.doi.org/10.21303/2585-6847.2019.001020


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ISSN 2585-6847 (Online), ISSN 2585-6839 (Print)